UV/ozone removal of contaminants in spacecraft environments

Details UV/ozone removal of contaminants in spacecraft environments UV/ozone removal of contaminants in spacecraft environments

Jan 1988

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1988spie..932..265b&link_type=abstract

IN: Ultraviolet technology II; Proceedings of the Meeting, Orlando, FL, Apr. 4, 5, 1988 (A89-29476 11-19). Bellingham, WA, Socie

Physics

Mercury Lamps, Ozone, Spacecraft Contamination, Spacecraft Environments, Oxygen, Partial Pressure, Resonance Lines, Sensors

Scientific paper

The UV/ozone cleaning process has been studied as both a method for preventing contaminant films from forming on optical surfaces of a space sensor during storage, and for removing them from these surfaces after formation. Using mercury resonance lines at 253.7 and 184.9 nm and O2 pressures in the range of 0.00008 to 0.0004 torr, removal efficiencies from 1.8 x 10 to the -26th to 4.4 x 10 the -26 cu cm/photon were measured.

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