XUV optical characterization of thin film and multilayer reflectors

Details XUV optical characterization of thin film and multilayer reflectors XUV optical characterization of thin film and multilayer reflectors

Jul 1989

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1989spie.1160..246w&link_type=abstract

IN: X-ray/EUV optics for astronomy and microscopy; Proceedings of the Meeting, San Diego, CA, Aug. 7-11, 1989 (A90-46006 21-74).

Physics

Optics

Extreme Ultraviolet Radiation, Laminates, Optical Properties, Reflectance, Thin Films, Carbon, Chromium Carbides, Molybdenum, Silicon, Surface Roughness Effects, Tungsten

Scientific paper

The measured XUV reflectance versus incidence angle is presented for several multilayer reflectors having various periods, fabricated from W/C, Mo/Si, and Cr3C2/C. These measurements are compared with calculations using recently derived optical constants, which are also presented. It is found that the agreement between the measured and calculated reflectance is best for nonzero values of the interface roughness parameter.

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