Wait and watch-monitoring photoresist thin films during heat treatment

Details Wait and watch-monitoring photoresist thin films during heat treatment Wait and watch-monitoring photoresist thin films during heat treatment

Jun 1998

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1998aipc..430..463h&link_type=abstract

The eleventh international conference on fourier transform spectroscopy. AIP Conference Proceedings, Volume 430, pp. 463-465 (1

Computer Science

1

Lithography, Masks And Pattern Transfer, Infrared Spectrometers, Auxiliary Equipment, And Techniques

Scientific paper

The changes of photoresist layers during heat treatment are studied by
infrared reflection spectroscopy. A simulation approach is used to
analyze the time-dependence of the reflectivity. Information on the
development of the layer thickness and the chemical composition is
obtained.

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