Ultra Fine Measurement of the Effect of a Vacuum Exposure on the Central Wavelength of Narrow-Bandpass Interference Filters Manufactured by Dual Ion Beam Sputtering

Details Ultra Fine Measurement of the Effect of a Vacuum Exposure on the Central Wavelength of Narrow-Bandpass Interference Filters Manufactured by Dual Ion Beam Sputtering Ultra Fine Measurement of the Effect of a Vacuum Exposure on the Central Wavelength of Narrow-Bandpass Interference Filters Manufactured by Dual Ion Beam Sputtering

Jun 2006

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2006esasp.621e.169f&link_type=gif

Sixth International Conference on Space Optics, Proceedings of ESA/CNES ICSO 2006, held 27-30 June 2006 at ESTEC, Noordwijk, The

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Optics

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