Two-dimensional Nanolithography Using Atom Interferometry

Details Two-dimensional Nanolithography Using Atom Interferometry Two-dimensional Nanolithography Using Atom Interferometry

2004-04-28

arxiv.org/abs/quant-ph/0404158v1

Phys. Rev. A 71, 043606 (2005)

Physics

Quantum Physics

36 pages, 4 figures

Scientific paper

10.1103/PhysRevA.71.043606

We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens system. The lens system is developed such that it allows simultaneous control over atomic wave-packet spatial extent, trajectory, and phase signature. We demonstrate arbitrary pattern formations with two-dimensional 87Rb wavepackets through numerical simulations of the scheme in a practical parameter space. Prospects for experimental realizations of the lithography scheme are also discussed.

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