Third Harmonic Generation at 223nm in the Metallic Regime of GaP

Details Third Harmonic Generation at 223nm in the Metallic Regime of GaP Third Harmonic Generation at 223nm in the Metallic Regime of GaP

2010-11-02

arxiv.org/abs/1011.0627v1

Physics

Optics

Scientific paper

We demonstrate second and third harmonic generation from a GaP substrate 500{\mu}m thick. The second harmonic field is tuned at the absorption resonance at 335nm, and the third harmonic signal is tuned at 223nm, in a range where the dielectric function is negative. These results show that a phase locking mechanism that triggers transparency at the harmonic wavelengths persists regardless of the dispersive properties of the medium, and that the fields propagate hundreds of microns without being absorbed even when the harmonics are tuned to portions of the spectrum that display metallic behavior.

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