The dimers stay intact: a quantitative photoelectron study of the adsorption system Si{100} (2x1)-C2H4

Details The dimers stay intact: a quantitative photoelectron study of the adsorption system Si{100} (2x1)-C2H4 The dimers stay intact: a quantitative photoelectron study of the adsorption system Si{100} (2x1)-C2H4

Nov 1999

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1999njph....1...20b&link_type=abstract

New Journal of Physics, Volume 1, Issue 1, pp. 20 (1999).

Physics

6

Scientific paper

Using the technique of photoelectron diffraction in the scanned energy mode we show that the Si dimer separation on the Si{100} surface following the adsorption of ethene (ethylene) is 2.36(+/-0.21) Å. This value is only very slightly larger than on the clean surface and shows that the dimer remains intact, thus providing a clear quantitative experimental resolution of a long controversy in the literature. The C-C and C-Si separations are 1.62+/-0.08 Å and 1.90+/-0.01 Å, respectively, the former indicating a bond order of less than one.

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