State of the art in thin film thickness and deposition rate monitoring sensors

Details State of the art in thin film thickness and deposition rate monitoring sensors State of the art in thin film thickness and deposition rate monitoring sensors

Feb 2005

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2005rpph...68..385b&link_type=abstract

Reports on Progress in Physics, Volume 68, Issue 2, pp. 385-409 (2005).

Physics

7

Scientific paper

In situ monitoring parameters are indispensable for thin film fabrication. Among them, thickness and deposition rate control are often the most important in achieving the reproducibility necessary for technological exploitation of physical phenomena dependent on film microstructure. This review describes the types of thickness and deposition rate sensors and their theoretical and phenomenological background, underlining their performances, as well as advantages and disadvantages.

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