Spectroscopic characterization of plane multilayer diffraction gratings using a laser-produced plasma XUV radiation source

Details Spectroscopic characterization of plane multilayer diffraction gratings using a laser-produced plasma XUV radiation source Spectroscopic characterization of plane multilayer diffraction gratings using a laser-produced plasma XUV radiation source

Jun 1998

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1998spie.3406...80k&link_type=abstract

Proc. SPIE Vol. 3406, p. 80-90, Current Russian Research in Optics and Photonics: New Methods and Instruments for Space- and Ear

Physics

Optics

Scientific paper

Spectral characteristics of plane multilayer amplitude molybdenum-silicon diffraction gratings (1000 and 2000 lines/mm, d-spacing of 115 angstrom), fabricated by electron- beam lithography, were determined using a laser-produced plasma XUV radiation source. The gratings were studied at near-normal incidence and at an angle of incidence of 36 degrees in stigmatic and quasi-stigmatic spectrograph systems with moderate dispersion. The task of focusing radiation was imposed on either a grazing-incidence toroidal mirror or a normal-incidence Mo-Si multilayer mirror with a d-spacing of 115 angstrom. The spectral profile of resonance reflection by the gratings was determined in the first and second Bragg orders of the multilayer structure for different angles of incidence. Line spectra of multiply charged F, Na, Mg, and Cl ions were recorded in the 160 - 230 angstrom range by means of these multilayer gratings, and the resolving power of the gratings was determined.

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