Simulation of Particle Growth and Transport in a Dusty Plasma

Details Simulation of Particle Growth and Transport in a Dusty Plasma Simulation of Particle Growth and Transport in a Dusty Plasma

Oct 2005

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2005aipc..799..205w&link_type=abstract

NEW VISTAS IN DUSTY PLASMAS: Fourth International Conference on the Physics of Dusty Plasmas. AIP Conference Proceedings, Volum

Physics

Dusty Plasmas, Plasma Simulation, Plasma Transport Processes, Plasma Cvd, Dusty Or Complex Plasmas, Plasma Crystals, Plasma Simulation, Transport Properties, Plasma-Based Ion Implantation And Deposition, Chemical Vapor Deposition

Scientific paper

The formation of dust particles during plasma-enhanced chemical vapor deposition can be beneficial to the properties of silicon thin films if deposition size and concentration can be controlled. Particle growth, transport, and charging models are combined with a plasma model to predict the size, charge, and spatial distributions of particles under typical deposition conditions. Plasma-particle interactions are discussed, and charge distribution results are presented. Positively charged particles are found to exist in regions near the electrodes, and may have a significant impact on both particle growth and film composition.

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