Sensor for monitoring plasma parameters

Details Sensor for monitoring plasma parameters Sensor for monitoring plasma parameters

2006-08-10

arxiv.org/abs/physics/0608113v1

Proc. SPIE, v.5339 (Photon Processing in Microelectronics and Photonics III), paper 5339-59, pp. 415-426 (2004)

Physics

Plasma Physics

Presented at the Photonics West conference, Lasers and Applications in Science and Technology, San Jose, CA, January 2004. Thi

Scientific paper

10.1117/12.528991

A spectrally tunable VCSEL (vertical cavity surface-emitting laser) was used as part of sensing hardware for measurements of the radial-integrated gas temperature inside an inductively coupled plasma reactor. The data were obtained by profiling the Doppler-broadened absorption of metastable Ar atoms at 763.51 nm in argon and argon/nitrogen plasmas (3, 45, and 90% N2 in Ar) at pressure 0.5-70 Pa and inductive power of 100 and 300 W. The results were compared to rotational temperature derived from the N2 emission at the (0,0) transition of the C - B system. The differences in integrated rotational and Doppler temperatures were attributed to non-uniform spatial distributions of both temperature and thermometric species (Ar* and N2*) that varied depending on conditions. A two-dimensional, two-temperature fluid plasma simulation was employed to explain these differences. This work should facilitate further development of a miniature sensor for non-intrusive acquisition of data (temperature and densities of multiple plasma species) during micro- and nano-fabrication plasma processing, thus enabling the diagnostic-assisted continuous optimization and advanced control over the processes. Such sensors would also enable tracking the origins and pathways of damaging contaminants, thereby providing real-time feedback for adjustment of processes. Our work serves as an example of how two line-of-sight integrated temperatures derived from different thermometric species make it possible to characterize the radial non-uniformity of the plasma.

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