Role of Current and Magnetic Field Structure at Directed Extreme Ultraviolet Generation in Plasma Discharge for Nano-Lithography

Details Role of Current and Magnetic Field Structure at Directed Extreme Ultraviolet Generation in Plasma Discharge for Nano-Lithography Role of Current and Magnetic Field Structure at Directed Extreme Ultraviolet Generation in Plasma Discharge for Nano-Lithography

Jun 2010

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2010aipc.1242..324m&link_type=abstract

PLASMAS IN THE LABORATORY AND THE UNIVERSE: Interactions, Patterns, and Turbulence. AIP Conference Proceedings, Volume 1242, pp

Physics

Lithography, Plasma Density, Ionisation, Lithography, Masks And Pattern Transfer, Gyrokinetics, Ionization Of Plasmas

Scientific paper

Role of surface current, magnetic field and control of particle dynamics
in a plasma discharge source of EUV has been considered.

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