Research and development of MEMS x-ray optics

Details Research and development of MEMS x-ray optics Research and development of MEMS x-ray optics

Aug 2005

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2005spie.5900..328e&link_type=abstract

Optics for EUV, X-Ray, and Gamma-Ray Astronomy II. Edited by Citterio, Oberto; O'Dell, Stephen L. Proceedings of the SPIE, Volum

Physics

Optics

Scientific paper

Development of a new light-weight and low-cost micro pore optics is reported. Utilizing anisotropic chemical wet etching of MEMS (Micro Electro Mechanical System) technology, a number of smooth sidewalls are obtained at once. These sidewalls are potential X-ray mirrors. As a first step of R&D, basic characters of sidewalls such as surface roughness and X-ray reflectivity are experimentally studied. Rms-roughness of 10 ~ 20Å is confirmed in a KOH-etched wafer. Furthermore, the X-ray reflection is for the first time detected at Mg Kα 1.25 keV. Based on the obtained results, numerical simulations of four-stage MEMS X-ray optics are performed for future satellite mission.

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