Reflectivity measurements of Ni/V, Ni/Ti, and W/C multilayer mirrors in the 2-6nm wavelength region using synchrotron radiation

Details Reflectivity measurements of Ni/V, Ni/Ti, and W/C multilayer mirrors in the 2-6nm wavelength region using synchrotron radiation Reflectivity measurements of Ni/V, Ni/Ti, and W/C multilayer mirrors in the 2-6nm wavelength region using synchrotron radiation

Jan 1992

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1992spie.1546..557n&link_type=abstract

Proc. SPIE Vol. 1546, p. 557-566, Multilayer and Grazing Incidence X-Ray/EUV Optics, Richard B. Hoover; Ed.

Physics

Optics

Scientific paper

Recent progress in the fields of physical vapor deposition (PVD), coupled with increased interest in the soft x-ray region of the electromagnetic spectrum, has driven the development of layered synthetic microstructures (LSMs) to the point that useful nongrazing incidence optics based on this technology are used in a variety of applications (e.g., solar astronomy, soft x-ray microscopy, and plasma spectroscopy). Our goal, as a production facility for thin film devices, was to demonstrate the capability for surement at 0.154 nm (CuK(alpha) ).

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