Recent developments in X-ray diffraction gratings at NPL

Physics

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Diffraction Patterns, Gratings (Spectra), Semiconductors (Materials), X Ray Diffraction, Gold Coatings, Photoconductors, Thin Films, Vacuum Deposition

Scientific paper

Techniques have been developed for making X-ray diffraction gratings in which the line pattern is photofabricated. Laminar gratings produced by this method are virtually indistinguishable from the best ruled X-ray gratings. Laminar gratings of varied groove depth have also been produced, and a theoretical study indicates that they should have a broadened efficiency-wavelength response, making them particularly useful for spectrographic work. The photofabrication process has also been used to make blazed gratings with the very shallow blaze angles needed for X-ray work. Absolute efficiencies in the first diffracted order range from about 5.5% at a wavelength of 0.229 nm to over 20% at 6.7 nm.

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