Production and characterization of ion-beam-sputtered multilayers

Details Production and characterization of ion-beam-sputtered multilayers Production and characterization of ion-beam-sputtered multilayers

Feb 1994

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1994spie.2011..299p&link_type=abstract

Proc. SPIE Vol. 2011, p. 299-309, Multilayer and Grazing Incidence X-Ray/EUV Optics II, Richard B. Hoover; Arthur B. Walker; Eds

Physics

Optics

Scientific paper

We report on the application of low pressure ion beam sputtering combined with simultaneous (neutralized) ion beam polishing to the production of multilayer structures for x-ray optics. Initial examination of these structures by high resolution diffractometry at 0.154 nm indicates that the structures exhibit a high degree of structural perfection.

Affiliated with

Also associated with

No associations

Rating

Production and characterization of ion-beam-sputtered multilayers does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Production and characterization of ion-beam-sputtered multilayers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production and characterization of ion-beam-sputtered multilayers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-957100