Plasmonic Modulator Optimized by Patterning of Active Layer and Tuning Permittivity

Details Plasmonic Modulator Optimized by Patterning of Active Layer and Tuning Permittivity Plasmonic Modulator Optimized by Patterning of Active Layer and Tuning Permittivity

2012-02-29

arxiv.org/abs/1202.6559v1

Physics

Optics

Scientific paper

We study a metal-insulator-metal waveguide as a surface plasmon polariton modulator. A multilayered core consists of a silicon nitride layer and an ultrathin active layer sandwiched between two silver plates that serve as electrodes. A transparent conducting oxide, indium tin oxide (ITO), as an ultrathin active layer with the varied carrier density is utilized. Under various anneal conditions different permittivity of ITO can be achieved, and we analyse it influence on the modulator efficiency. To advance the modulator design, namely to increase transmittance and enhance modulation depth, we propose to substitute the continuous active layer by a one-dimension periodic grating. The dependence on the pattern size and filling factor of the active material is analyzed for tuned permittivity of the ITO layer.

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