Phase measurement system with transmitted UV light for phase-shifting mask inspection

Details Phase measurement system with transmitted UV light for phase-shifting mask inspection Phase measurement system with transmitted UV light for phase-shifting mask inspection

Nov 1994

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1994spie.2254..294k&link_type=abstract

Proc. SPIE Vol. 2254, p. 294-301, Photomask and X-Ray Mask Technology, Hideo Yoshihara; Ed.

Physics

Scientific paper

This paper describes a direct phase measurement system with transmitted UV-light for phase shifting mask (PSM) inspection using a shearing interferometer microscope. Measurements were made with 365 nm monochromatic light of mercury arc lamp. The accuracy of this system is sufficient for the application for phase shifting mask inspection. The measurement results are in good agreement with the calculation based on quartz step height measurement and refractive index. Wafer exposure results of attenuating-type PSM also agree with the phase measurement results.

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