Oxygen and silicon self-diffusion in natural olivine at T = 1300°C

Physics

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Scientific paper

Oxygen and silicon self-diffusion in natural olivine single crystals (Mg0.89 Fe0.11)2 SiO4 from San Carlos, Arizona, have been measured for the first time at T = 1300°C in controlled oxygen partial pressure pO2 ranging from 10-4 to 10 Pa. Polished and chemically-etched specimens were heated for several hours in a gas mixture H2/CO2 or H2/H218O. The latter gas mixture provides both the controlled pO2 and the isotopic reservoir for the 18O diffusion across the gas-solid interface. For 30Si diffusion, a thin layer of isotopic forsterite Mg230SiO4 (few hundreds of angstroms) was deposited onto the olivine surface. Diffusion profiles for oxygen and silicon were determined using the nuclear reaction 18O(p,α)15N and Rutherford back-scattering of 2 MeV α particles, respectively. The diffusion coefficients are Dox = 10-18 +/- 0.6m2s-1 for oxygen and DSi = 10-20m2s-1 for silicon. We conclude from these measurements on San Carlos olivine at T = 1300°C that: (1) Si is the slowest diffusing species in natural olivine, as it is in forsterite, and (2) 30Si and 18O diffuse 30 to 200 times faster in olivine than in forsterite.

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