Optimization of deposition uniformity in a planet rotation system with precise mask design

Details Optimization of deposition uniformity in a planet rotation system with precise mask design Optimization of deposition uniformity in a planet rotation system with precise mask design

Dec 2007

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2007spie.6722e..90l&link_type=abstract

3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technolog

Physics

Scientific paper

Generally, substrates in a planetary rotation system result in coatings with nonuniformity of 2% or greater over apertures of 500mm. However, more accurate, uniform deposition of large-aperture optical coatings is required now. So it is very important to study how to improve the deposition uniformity of large-aperture optical coatings. In this paper, we show that a theoretical model that can forecast the thickness distributions of films, get precise figure of masks, and should optimize the deposition uniformity accurately and fast through fixing the designed masks in the chamber.

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