Optical Properties and Characterization of Thin-film Uranium Oxide in the XUV

Details Optical Properties and Characterization of Thin-film Uranium Oxide in the XUV Optical Properties and Characterization of Thin-film Uranium Oxide in the XUV

Apr 2002

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2002aps..apri16014s&link_type=abstract

American Physical Society, April Meeting, Jointly Sponsored with the High Energy Astrophysics Division (HEAD) of the American As

Astronomy and Astrophysics

Astrophysics

Scientific paper

Due to the high reflectivity of uranium in the XUV, uranium thin films have previously been studied for use in applications such as space telescopes and in multilayer mirrors. Unfortunately, these thin films are highly unstable due to the rapid oxidation of uranium upon removal from vacuum. This instability in uranium countered with its high reflectivity in this region has led to increased interest in uranium oxide thin films because of their stability and high reflectivity. We will discuss characterization results of thin-film uranium oxide from ellipsometry, X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy, and reflectometry. From these characterization techniques, we will present our values for the index of refraction in the extreme ultraviolet and compare with previous data.

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