Optical anisotropy of nanostructured silicon films studied by Fourier transform infrared spectroscopy

Details Optical anisotropy of nanostructured silicon films studied by Fourier transform infrared spectroscopy Optical anisotropy of nanostructured silicon films studied by Fourier transform infrared spectroscopy

May 2002

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2002spie.4748..350k&link_type=abstract

Proc. SPIE Vol. 4748, p. 350-356, ICONO 2001: Fundamental Aspects of Laser-Matter Interaction and Physics of Nanostructures, Ana

Physics

Scientific paper

Electrochemically nanostructured Si films with surface orientation (110) prepared at different current density were investigated by Fourier transform infrared spectroscopy. The spectra exhibit beats of interference fringes arisen from the summation of intensities of ordinary and extraordinary waves which interfere in the film. The investigated films are shown to exhibit properties of a negative uniaxial crystal (no > ne) with optical axis lying in the surface plane along [001] direction. The value of birefringence reaches 18% for nanostructured Si films with porosity of 80%. Experimental data agree with calculations based on the effective media approximation for anisotropically spaced Si nanocrystals.

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