On the operation of a Micropattern Gaseous UV-Photomultiplier in Liquid-Xenon

Details On the operation of a Micropattern Gaseous UV-Photomultiplier in Liquid-Xenon On the operation of a Micropattern Gaseous UV-Photomultiplier in Liquid-Xenon

2011-01-19

arxiv.org/abs/1101.3747v2

JINST 6:P04007,2011

Physics

Instrumentation and Detectors

12 pages, 9 figures, submitted to JINST

Scientific paper

10.1088/1748-0221/6/04/P04007

Operation results are presented of a UV-sensitive gaseous photomultiplier (GPM) coupled through a MgF2 window to a liquid-xenon scintillator. It consisted of a reflective CsI photocathode deposited on top of a THick Gaseous Electron Multiplier (THGEM); further multiplication stages were either a second THGEM or a Parallel Ionization Multiplier (PIM) followed by a MICROMEsh GAseous Structure (MICROMEGAS). The GPM operated in gas-flow mode with non-condensable gas mixtures. Gains of 10^4 were measured with a CsI-coated double-THGEM detector in Ne/CH4 (95:5), Ne/CF4 (95:5) and Ne/CH4/CF4 (90:5:5), with soft X-rays at 173 K. Scintillation signals induced by alpha particles in liquid xenon were measured here for the first time with a double-THGEM GPM in He/CH4 (92.5:7.5) and a triple-structure THGEM/PIM/MICROMEGAS GPM in Ne/CH4 (90:10) with a fast-current preamplifier.

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