Nonadiabatic simulation study of photoisomerization of azobenzene: Detailed mechanism and load-resisting capacity

Details Nonadiabatic simulation study of photoisomerization of azobenzene: Detailed mechanism and load-resisting capacity Nonadiabatic simulation study of photoisomerization of azobenzene: Detailed mechanism and load-resisting capacity

2009-07-10

arxiv.org/abs/0907.1729v1

J Chem Phys 129 (2008) 164111(1-9)

Physics

Chemical Physics

9 printed pages

Scientific paper

Nonadiabatic dynamical simulations were carried out to study cis-to-trans isomerization of azobenzene under laser irradiation and/or external mechanical loads. We used a semiclassical electron-radiation-ion dynamics method that is able to describe the coevolution of the structural dynamics and the underlying electronic dynamics in a real-time manner. It is found that azobenzene photoisomerization occurs predominantly by an out-of-plane rotation mechanism even under a nontrivial resisting force of several tens of piconewtons. We have repeated the simulations systematically for a broad range of parameters for laser pulses, but could not find any photoisomerization event by a previously suggested in-plane inversion mechanism. The simulations found that the photoisomerization process can be held back by an external resisting force of 90 - 200 pN depending on the frequency and intensity of the lasers. This study also found that a pure mechanical isomerization is possible from the cis state if the azobenzene molecule is stretched by an external force of 1250 -1650 pN. Remarkably, the mechanical isomerization first proceeds through a mechanically activated inversion, and then is diverted to an ultrafast downhill rotation that accomplishes the isomerization. Implications of these findings to azobenzene-based nanomechanical devices are discussed.

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