Nitric acid photolysis on surfaces in low-NOx environments: Significant atmospheric implications

Details Nitric acid photolysis on surfaces in low-NOx environments: Significant atmospheric implications Nitric acid photolysis on surfaces in low-NOx environments: Significant atmospheric implications

Dec 2003

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2003georl..30asc12z&link_type=abstract

Geophysical Research Letters, Volume 30, Issue 23, pp. ASC 12-1, CiteID 2217, DOI 10.1029/2003GL018620

Physics

19

Atmospheric Composition And Structure: Biosphere/Atmosphere Interactions, Atmospheric Composition And Structure: Chemical Kinetic And Photochemical Properties, Atmospheric Composition And Structure: Constituent Sources And Sinks, Atmospheric Composition And Structure: Troposphere-Composition And Chemistry, Atmospheric Composition And Structure: Troposphere-Constituent Transport And Chemistry

Scientific paper

Nitric acid (HNO3) is the dominant end product of NOx (= NO + NO2) oxidation in the troposphere, and its dry deposition is considered to be a major removal pathway for the atmospheric reactive nitrogen. Here we present both field and laboratory results to demonstrate that HNO3 deposited on ground and vegetation surfaces may undergo effective photolysis to form HONO and NOx, 1-2 orders of magnitude faster than in the gas phase and aqueous phase. With this enhanced rate, HNO3 photolysis on surfaces may significantly impact the chemistry of the overlying atmospheric boundary layer in remote low-NOx regions via the emission of HONO as a radical precursor and the recycling of HNO3 deposited on ground surfaces back to NOx.

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