New family of 1:1 catadioptric broadband deep-UV high-Na lithography lenses

Details New family of 1:1 catadioptric broadband deep-UV high-Na lithography lenses New family of 1:1 catadioptric broadband deep-UV high-Na lithography lenses

Jul 1991

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1991spie.1463..688z&link_type=abstract

Proc. SPIE Vol. 1463, p. 688-694, Optical/Laser Microlithography IV, Victor Pol; Ed.

Physics

Scientific paper

This family of optical systems is developed from the Wynne-Dyson system, which can be used in UV and deep-UV lithography systems. Its numerical aperture is larger than 0.4, its spectral bandwidth is wide, so the unnarrowed excimer laser or mercury lamp can be used as an illuminator in these lenses and even the through-lens alignment system can be used in the lithography systems in which these lenses are used.

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