Physics
Scientific paper
Jul 1991
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1991spie.1463..688z&link_type=abstract
Proc. SPIE Vol. 1463, p. 688-694, Optical/Laser Microlithography IV, Victor Pol; Ed.
Physics
Scientific paper
This family of optical systems is developed from the Wynne-Dyson system, which can be used in UV and deep-UV lithography systems. Its numerical aperture is larger than 0.4, its spectral bandwidth is wide, so the unnarrowed excimer laser or mercury lamp can be used as an illuminator in these lenses and even the through-lens alignment system can be used in the lithography systems in which these lenses are used.
Wang Zhijiang
Zhang Yudong
Zou Haixing
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