Multilevel Clustering Fault Model for IC Manufacture

Details Multilevel Clustering Fault Model for IC Manufacture Multilevel Clustering Fault Model for IC Manufacture

2003-10-02

arxiv.org/abs/physics/0310012v1

Physics

Data Analysis, Statistics and Probability

10 pages, the International Conference "Micro- and Nanoelectronics- 2003" (ICMNE-2003),Zvenigorod, Moscow district, Russia, Oc

Scientific paper

10.1117/12.562667

A hierarchical approach to the construction of compound distributions for process-induced faults in IC manufacture is proposed. Within this framework, the negative binomial distribution is treated as level-1 models. The hierarchical approach to fault distribution offers an integrated picture of how fault density varies from region to region within a wafer, from wafer to wafer within a batch, and so on. A theory of compound-distribution hierarchies is developed by means of generating functions. A study of correlations, which naturally appears in microelectronics due to the batch character of IC manufacture, is proposed. Taking these correlations into account is of significant importance for developing procedures for statistical quality control in IC manufacture. With respect to applications, hierarchies of yield means and yield probability-density functions are considered.

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