Multilayer thin film design as far ultraviolet polarizers

Details Multilayer thin film design as far ultraviolet polarizers Multilayer thin film design as far ultraviolet polarizers

Jan 1993

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1993spie.1742..413k&link_type=abstract

In: Multilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San

Physics

Optics

2

Far Ultraviolet Radiation, Laminates, Polarizers, Structural Design, Thin Films, Ultraviolet Reflection, Aluminum, Ceramic Coatings, Magnesium Fluorides, Metal Films, Polarization Characteristics

Scientific paper

We use a concept of induced transmission and absorption to design multilayer thin film reflection polarizers in the FUV region. We achieve high s-polarization reflectance and a high degree of polarization by means of a MgF2/Al/MgF2 three layer structure on an opaque thick film of aluminum as the substrate. For convenience they are designed at a 45 deg angle of incidence. For example, our polarizer designed for the Lyman-alpha line (121.6 nm) has 88.67 percent reflectance for the s-polarization case, and 1.21 percent for the p-polarization case, with a degree of polarization of 97.31 percent. If we make a double surface polarizer with this design, it will have a degree of polarization of 99.96 percent and s-polarization throughput of 78.62 percent.

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