Physics – Optics
Scientific paper
Jul 1989
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1989spie.1160..235s&link_type=abstract
IN: X-ray/EUV optics for astronomy and microscopy; Proceedings of the Meeting, San Diego, CA, Aug. 7-11, 1989 (A90-46006 21-74).
Physics
Optics
2
Laminates, Mirrors, Protective Coatings, Reflectance, X Ray Imagery, Backscattering, Molybdenum, Scanning Tunneling Microscopy, Silicon, Synchrotron Radiation, X Ray Diffraction
Scientific paper
Several multilayer mirrors were designed for peak reflectivity at 182.2 A and 45 deg angle of incidence, with Si as the spacer material and Mo as the absorber. Multilayer mirrors were produced by sputtering or by MBE and were characterized using Rutherford backscattering spectroscopy, XRD, and scanning tunneling microscopy. Synchrotron radiation was used to measure the reflectivity as a function of wavelength in the design region. An optimizing computer code was used to find the best layer thickness and the optimal total number of layers. The measured reflectivity at 45 deg, scaled for 100 percent S-polarized light, ranged from 29 percent for a sputter-deposited mirror to 47 percent for a mirror produced by MBE.
Burkland Mike K.
Kearney Patrick A.
Lampis A. R.
Milanovic Zoran
Slaughter J. M.
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