Multilayer diffraction at 104 keV

Details Multilayer diffraction at 104 keV Multilayer diffraction at 104 keV

Jan 1993

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1993spie.1742..324k&link_type=abstract

In: Multilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San

Physics

Optics

Imaging Spectrometers, Laminates, Solar X-Rays, Synchrotron Radiation, X Ray Diffraction, X Ray Imagery, X Ray Telescopes, Cameras, Light Sources, Metal Films, Silicon, Solar Cycles, Solar Flares, Tungsten

Scientific paper

We have measured the diffraction peak of a W:Si synthetic multilayer
reflector at 104 keV using the High Energy Bonse-Hart Camera at the
X-17B hard X-ray wiggler beam line of the National Synchrotron Light
Source at Brookhaven National Laboratory. The characteristics of the
diffraction peak are described and compared to theory.

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