Physics – Instrumentation and Detectors
Scientific paper
2008-11-27
Nucl.Instrum.Meth.A604:380-384,2009
Physics
Instrumentation and Detectors
5 pages, 7 figures, submitted to Nuclear Instruments and Methods A
Scientific paper
10.1016/j.nima.2009.01.178
This paper presents the design and test results of a prototype monolithic pixel sensor manufactured in deep-submicron fully-depleted Silicon-On-Insulator (SOI) CMOS technology. In the SOI technology, a thin layer of integrated electronics is insulated from a (high-resistivity) silicon substrate by a buried oxide. Vias etched through the oxide allow to contact the substrate from the electronics layer, so that pixel implants can be created and a reverse bias can be applied. The prototype chip, manufactured in OKI 0.15 micron SOI process, features both analog and digital pixels on a 10 micron pitch. Results of tests performed with infrared laser and 1.35 GeV electrons and a first assessment of the effect of ionising and non-ionising doses are discussed.
Battaglia Marco
Bisello Dario
Contarato Devis
Denes Peter
Giubilato Piero
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