Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2

Details Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2 Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2

2008-09-12

arxiv.org/abs/0809.2177v1

Physics

Plasma Physics

11 pages, 14 figures

Scientific paper

10.1063/1.3095760

We study the properties of a capacitive 13.56 MHz discharge properties with a mixture of Ar/C2H2 taking into account the plasmochemistry and growth of heavy hydrocarbons. A hybrid model was developed to combine the kinetic description for electron motion and the fluid approach for negative and positive ions transport and plasmochemical processes. A significant change of plasma parameters related to injection of 5.8% portion of acetylene in argon was observed and analyzed. We found that the electronegativity of the mixture is about 30%. The densities of negatively and positively charged heavy hydrocarbons are sufficiently large to be precursors for the formation of nanoparticles in the discharge volume.

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