Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

Details Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

Nov 2000

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2000spie.4146...35d&link_type=abstract

Proc. SPIE Vol. 4146, p. 35-46, Soft X-Ray and EUV Imaging Systems, Winfried M. Kaiser; Richard H. Stulen; Eds.

Physics

1

Scientific paper

In this paper, the metrology and fabrication concepts at Carl Zeiss will
be reviewed. The present status in the fabrication of specific EUVL
mirrors will be reported as well.

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