Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber

Details Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber

2007-11-16

arxiv.org/abs/0711.2614v1

Physics

Instrumentation and Detectors

6 pages, 7 postscript figures, talk at the XIV-th Int. School "Particles and Cosmology"

Scientific paper

The construction of an ion pulse ionization chamber aimed at measuring
ultra-low levels of surface alpha-activity of different samples is described.
The results of measurement carried out with alpha-source and copper samples and
light-reflecting film VM2000 are presented.

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