Mass effects on angular distribution of sputtered atoms

Details Mass effects on angular distribution of sputtered atoms Mass effects on angular distribution of sputtered atoms

May 1979

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1979jap....50.3677o&link_type=abstract

Journal of Applied Physics, vol. 50, May 1979, p. 3677-3683. Research supported by the Ford Motor Co., NASA, and ERDA.

Physics

25

Atomic Collisions, Ion Atom Interactions, Ion Impact, Metal Surfaces, Sputtering, Alloys, Backscattering, Ion Temperature, Solar Activity Effects, Solar Wind, Thin Films

Scientific paper

Sputtering metal targets at low ion energies (Hg or Ar at less than 300 eV) under normal ion incidence causes the lighter atoms (lighter isotopes or lighter elements of alloys) to be preferentially ejected in a direction normal to the target surface. Experimental results are shown for several elements and alloys at various bombardment energies. The amount of enrichment of the lighter species normal to the target surface decreases quite rapidly with increasing ion energy. The phenomenon is a result of reflective collisions because lighter atoms can be backscattered from heavier ones underneath but not vice versa. The effect provides an explanation of why solar-wind-exposed lunar material is enriched in the heavier isotopes, since sputtered lower-mass elements have a higher chance of achieving the lunar escape velocity.

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