Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics

Details Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics Ion beam deposited Mo/Si multilayers for EUV imaging applications in astrophysics

Feb 2004

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2004spie.5250...99r&link_type=abstract

Advances in Optical Thin Films. Edited by Amra, Claude; Kaiser, Norbert; Macleod, H. Angus. Proceedings of the SPIE, Volume 525

Physics

Optics

4

Scientific paper

Imaging of the solar corona by selecting Fe IX (λ=17.1nm,), Fe XII (λ=19.5nm), Fe XV (λ=28.4nm) and He II (λ=30.4nm) emission lines with a Ritchey-Chretien telescope requires to coat the optics with multilayers having a high accuracy in their layer thicknesses, a high reflectivity and an optimal bandpass. Multilayers were simulated in order to determine the most adequate formula for each wavelength channel. Mo/Si coatings were deposited by using the ion beam sputtering technique in a high vacuum chamber equipped with a micro balance and an in-situ reflectometer. The multilayers were studied by grazing angle reflectometry at 0.1541nm, and their reflectances around the operating wavelengths were measured on the SA62 IAS/LURE beam line of the SuperACO synchrotron facility located at Orsay. In addition, aging versus time and behavior of the multilayers under a rapid thermal annealing were investigated. Performances of the ion-beam deposited multilayers have been improved compared to the Mo/Si coatings obtained in the past by the e-beam evaporation technique for the SOHO mission Extreme UV Imaging Telescope (EIT). The EUVI telescopes for the STEREO mission are being proceduced by depositing these new generation of multilayers onto primary and secondary mirrors. The reflectivity measurements on a telescope are presented.

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