Investigation of Properties of Boron Thin Film Deposited By Thermionic Vacuum Arc Technology

Details Investigation of Properties of Boron Thin Film Deposited By Thermionic Vacuum Arc Technology Investigation of Properties of Boron Thin Film Deposited By Thermionic Vacuum Arc Technology

Apr 2007

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2007aipc..899..699e&link_type=abstract

SIXTH INTERNATIONAL CONFERENCE OF THE BALKAN PHYSICAL UNION. AIP Conference Proceedings, Volume 899, pp. 699-699 (2007).

Physics

Thermionic And Filament-Based Sources, Discharge In Vacuum

Scientific paper

In this study, we first used boron as anode material in the TVA system.
We also present boron thin film deposition using TVA technology.

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