Physics – Optics
Scientific paper
Jun 2008
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2008spie.7028e..79m&link_type=abstract
Photomask and Next-Generation Lithography Mask Technology XV. Edited by Horiuchi, Toshiyuki. Proceedings of the SPIE, Volume 70
Physics
Optics
Scientific paper
By refining the entire optical system in our LM7500 reticle inspection system, we have successfully improved the image quality and inspection speed. The LM7500 system uses a beam scanning method in which the inspection pixel size is switched by changing the magnification ratio of the telescope in the section subsequent to the scanner's optical system. The telescope magnification ratio is designed to meet the requirements of the light spot diameter and beam scanning width on a reticle, and specifies the scanning speed. We have realized a smaller light spot diameter by improving the design of the section prior to the optical system, including the AOD (acousto-optic deflector), which is the starting point of the scanner's optics. This has led to faster scanning. We have also succeeded in minimizing the adjustment error by optimizing the magnification ratio of the telescope, thus increasing the adjustment margin of the incident light beam entering the section subsequent to the scanner's optical system. This means that the difference in the X and Y directions of an image can be suppressed to a remarkable extent for a beam scanning system. Moreover, because the LM7500 scans both transmitted and reflected light simultaneously, pattern inspections, particle inspections and even scribe-tri-tone inspections can be carried out at the same time. We have also succeeded in increasing the inspection speed by 30% through optical system optimization.
Bashomatsu Takeshi
Matsumura Kenichi
Moribe Hideyuki
Takahashi Hiroyuki
Uehara Akira
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