Holographic multilayer versus dielectric multilayer optics for XUV applications

Details Holographic multilayer versus dielectric multilayer optics for XUV applications Holographic multilayer versus dielectric multilayer optics for XUV applications

Jul 1989

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1989spie.1160..304j&link_type=abstract

IN: X-ray/EUV optics for astronomy and microscopy; Proceedings of the Meeting, San Diego, CA, Aug. 7-11, 1989 (A90-46006 21-74).

Physics

Optics

Dielectrics, Extreme Ultraviolet Radiation, Holography, Laminates, High Temperature, High Vacuum, Pinholes, Yield Point

Scientific paper

Recent results have demonstrated that XUV multilayer optics can be fabricated via advanced holographic technology from proprietary materials. The XUV holographic multilayer technology offers many advantages such as simplification in overall fabrication, normal temperature deposition, much lower fabrication cost, high diffraction efficiency, high laser damage threshold and temperature stability, and scalability to very large optics or nonconventional structures.

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