Graded period multilayer structures for X-ray optics

Details Graded period multilayer structures for X-ray optics Graded period multilayer structures for X-ray optics

Jan 1993

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1993spie.1742..304b&link_type=abstract

In: Multilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San

Physics

Optics

Laminates, Optics, Thin Films, Vapor Deposition, X Ray Diffraction, X Ray Spectroscopy, Electron Beams, Laser Ablation, Magnetron Sputtering, Molecular Beam Epitaxy

Scientific paper

Our goal for FY 91 was to develop the capability to deposit multilayer thin film coatings of prescribed period gradient onto planar and figured substrates. To accomplish this goal we have extended our use of deposition flux masking to create laterally graded multilayer coatings. In addition, we have constructed a planetary substrate rotation fixture for deposition of axisymmetric graded thickness multilayer structures on planar and figured optics. Materials combinations for the layered synthetic microstructures (LSM's) we have fabricated by these techniques include: tungsten/carbon, molybdenum/silicon, molybdenum disilicide/silicon and chromium carbide/carbon. Soft X-ray diffraction characterization of the LSM's has verified that we have deposited controlled thickness graded period structures.

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