Fission track dating of zircon: Improved etching techniques

Details Fission track dating of zircon: Improved etching techniques Fission track dating of zircon: Improved etching techniques

Dec 1976

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1976e%26psl..33..273g&link_type=abstract

Earth and Planetary Science Letters, Volume 33, Issue 2, p. 273-276.

Physics

17

Scientific paper

A simple new technique for the etching of fission tracks in zircon has been developed which overcomes the practical difficulties of previously described techniques. The etchant is a low melting-point binary eutectic of KOH and NaOH which is used at 200-220°C. As for previous etchants the etching time is strongly dependent on the spontaneous track density. The etched tracks have very similar characteristics to those produced by the earlier 100N NaOH etchant.

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