Experimental investigation of an instability during the nanocrystallite formation in an Ar/SiH4 radiofrequency plasma

Physics

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Plasma Instability, Dusty Plasmas, Crystals, High-Frequency Discharges, Silicon Compounds, Argon, Waves, Oscillations, And Instabilities In Plasmas And Intense Beams, Dusty Or Complex Plasmas, Plasma Crystals, High-Frequency And Rf Discharges

Scientific paper

An experimental investigation of an instability occuring during the nanocrystallite formation is presented. The present study has been achieved in radiofrequency low pressure argon/silane plasmas. The analysis of the amplitude of the third harmonics of the discharge current and the self-bias voltage induced by the reactor asymmetry enables to follow the nanoparticle formation and growth. In some cases, at the end of the nanocrystallite accumulation phase, an instability occurs. A detailed study of the influence of several parameters on this instability behavior and frequencies is presented.

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