EUV spectrometric facility with laser-focus plasma radiation source

Details EUV spectrometric facility with laser-focus plasma radiation source EUV spectrometric facility with laser-focus plasma radiation source

Jul 1996

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1996spie.2805..277p&link_type=abstract

Proc. SPIE Vol. 2805, p. 277-281, Multilayer and Grazing Incidence X-Ray/EUV Optics III, Richard B. Hoover; Arthur B. Walker; Ed

Physics

Optics

Scientific paper

A spectrometric facility for measurements of reflection, absorption and excitation spectra of films and massive samples in 50 to 300 nm wavelength region with the spectral resolution up to 10(superscript 3) is designed and tested. Plasma produced EUV radiation from the laser beam focused onto a gaseous or a solid target makes it possible to achieve the spectral intensity on a sample up to 3(DOT)10(superscript 6) photons/s(DOT)cm(superscript -1). Application to measurement of reflection spectra of some phthalocynines is reported here.

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