Physics
Scientific paper
Feb 2008
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2008njph...10b3013s&link_type=abstract
New Journal of Physics, Volume 10, Issue 2, pp. 023013 (2008).
Physics
4
Scientific paper
Cluster ion beams create considerably more damage in silicon and other substrates and eject more material than single ions that deposit at the same kinetic energy on the substrate. The mechanisms that causes the non-linear growth of damage and sputtering are interesting from the point of view of both basic materials research and industrial applications. Using classical molecular dynamics, we analyse the dynamics of collision cascades that are induced in amorphous silicon by small noble gas nanoclusters. We show that the sputtering and other non-linear effects emerge due to the high-energy density induced in a relatively small region in the substrate during the cluster stopping phase and because of the timing of consequent events that dissipate the energy over a larger volume of the substrate.
Nordlund Kai
Samela Juha
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