Electron collisions with the CF3 radical using the R-matrix method

Details Electron collisions with the CF3 radical using the R-matrix method Electron collisions with the CF3 radical using the R-matrix method

Nov 2003

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2003njph....5..155r&link_type=abstract

New Journal of Physics, Volume 5, Issue 1, pp. 155 (2003).

Physics

14

Scientific paper

Fluorocarbons are the main species used in etching plasmas and their properties are driven by CFx (x = 1 3) radicals. Previous calculations on CF and CF2 show low-lying resonances which may lead to dissociative electron attachment under standard plasma conditions. Here the R-matrix method is used to treat electron collisions with the polyatomic radical CF3 at its equilibrium geometry using a coupled states expansion. These calculations concentrate on obtaining low-energy, sub-10 eV, elastic and excitation cross-sections. A CF3- bound state of 1A1 symmetry is detected but no low-lying resonances. These findings suggest that CF3 is unlikely to undergo dissociative electron attachment; the possible consequences of this for etching plasmas are discussed.

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