Effects of different surface treatments of CZT samples on the values of DCRC FWHM of x-ray diffraction

Details Effects of different surface treatments of CZT samples on the values of DCRC FWHM of x-ray diffraction Effects of different surface treatments of CZT samples on the values of DCRC FWHM of x-ray diffraction

Aug 1998

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1998spie.3553...61m&link_type=abstract

Proc. SPIE Vol. 3553, p. 61-65, Detectors, Focal Plane Arrays, and Imaging Devices II, Pingzhi Liang; Marc Wigdor; William G. Fr

Physics

Scientific paper

Cd(subscript 1-y)Zn(subscript y)Te (CZT) wafers with (111) orientations, which serve as the common substrates for Hg(subscript 1-x)Cd(subscript x)Te (MCT) epitaxial deposition, were treated with different processes of mechanical polishing and chemical etching and then tested by x-ray diffraction unit with the same experimental conditions. The conclusion is that the sample surface treatment dramatically influences the values of DCRC FWHM. The most desirable process and its experimental conditions for accurate measurement of DCRC FWHM have also been reported in this paper.

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