Effect of Electron Energy Distribution Function on Power Deposition and Plasma Density in an Inductively Coupled Discharge at Very Low Pressures

Details Effect of Electron Energy Distribution Function on Power Deposition and Plasma Density in an Inductively Coupled Discharge at Very Low Pressures Effect of Electron Energy Distribution Function on Power Deposition and Plasma Density in an Inductively Coupled Discharge at Very Low Pressures

2002-10-28

arxiv.org/abs/physics/0210114v1

Physics

Plasma Physics

19 pages submitted to Plasma Sources Sci. Technol

Scientific paper

10.1088/0963-0252/12/3/302

A self-consistent 1-D model was developed to study the effect of the electron energy distribution function (EEDF) on power deposition and plasma density profiles in a planar inductively coupled plasma (ICP) in the non-local regime (pressure < 10 mTorr). The model consisted of three modules: (1) an electron energy distribution function (EEDF) module to compute the non-Maxwellian EEDF, (2) a non-local electron kinetics module to predict the non-local electron conductivity, RF current, electric field and power deposition profiles in the non-uniform plasma, and (3) a heavy species transport module to solve for the ion density and velocity profiles as well as the metastable density. Results using the non-Maxwellian EEDF model were compared with predictions using a Maxwellian EEDF, under otherwise identical conditions. The RF electric field, current, and power deposition profiles were different, especially at 1mTorr, for which the electron effective mean free path was larger than the skin depth. The plasma density predicted by the Maxwellian EEDF was up to 93% larger for the conditions examined. Thus, the non-Maxwellian EEDF must be accounted for in modeling ICPs at very low pressures.

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