Direct MBE growth of HgCdTe(112) IR detector structures on Si(112) substrates

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Scientific paper

Molecular-beam epitaxy (MBE) has been utilized to deposit single crystal epitaxial films of CdTe(112)B and HgCdTe(112)B directly onto Si(112) substrates without the use of GaAs interfacial layers. The films have been characterized with x-ray diffraction and wet chemical defect etching, and IR detectors have been fabricated and tested. CdTe(112)B films are twin- free and have x-ray rocking curves as narrow as 72 arc-seconds and near-surface etch pit density (EPD) of 2 X 10(superscript 6) cm(superscript -2) for 8 micrometers -thick films. HgCdTe(112)B films deposited on Si substrates have x-ray rocking curve FWHM as low as 92 arc-seconds and EPD of 8 - 30 X 10(superscript 6) cm(superscript -2). HgCdTe/Si infrared detectors have been fabricated with R(subscript 0)A equals 4.3 X 10(superscript 3) (Omega) -cm(superscript 2) (f/2 FOV) and 7.8 micrometers cutoff wavelength at 78 K to demonstrate the capability of MBE for growth of large-area HgCdTe arrays on Si.

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