Differential equation method for design of multimirror x-ray projection lithography systems

Details Differential equation method for design of multimirror x-ray projection lithography systems Differential equation method for design of multimirror x-ray projection lithography systems

Jan 1992

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1992spie.1547..111w&link_type=abstract

Proc. SPIE Vol. 1547, p. 111-126, Multilayer Optics for Advanced X-Ray Applications, Natale M. Ceglio; Ed.

Physics

Optics

Scientific paper

Based on Korsch's method for design of high performance telescopes, a differential equation design method (DEDM) for soft x-ray projection lithography has been developed. This method enables one to solve numerically for the shapes of two mirrors in a system such that the entire system rigorously satisfies the conditions of aplanatism. The shape of the other mirror(s) in the system are adjusted to minimize the residual aberrations. Three-mirror and four-mirror projection systems have been designed by using DEDM. Analysis of results is presented.

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