Physics – Optics
Scientific paper
Aug 2008
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2008spie.7077e..45z&link_type=abstract
Advances in X-Ray/EUV Optics and Components III. Edited by Khounsary, Ali M.; Morawe, Christian; Goto, Shunji. Proceedings of t
Physics
Optics
Scientific paper
Three kinds of multilayer mirrors were developed for solar observation and earth's magnetosphere observation at Extreme Ultraviolet (EUV) wavelength region. The first one is Mo/Si multilayer mirror, designed for solar Fe-XII emission line at wavelength of 19.5nm. The reflectivities are in the range of 38.7~42.9%, measured at National Synchrotron Radiation Laboratory (NSRL), Hefei, China. The second high-reflective multilayer is designed for solar He-II radiation at 30.4 nm. At this wavelength, SiC/Mg multilayers were investigated, and as high as 50.0% measured reflectivity was obtained at incident angle of 10°. Aperiodic SiC/Mg multilayers were also designed for wide angular ranges of 15-22° and 12-21°. The third multilayer mirror was a dual-function mirror used for earth's magnetosphere observation, which requires high-reflective for He-II emission line at wavelength of 30.4nm but low-reflectance at 58.4nm from ionosphere He-I emission. Using aperiodic SiC/Mg multilayer stack, the dual-function multilayer mirror was designed by genetic algorithm. Compared to periodic multilayer, the dual-function multilayer suppresses the reflectivity for He-I at 58.4nm from 2.2% to 0.1%, without loss of the reflection for He-II at 30.4nm, significantly. These multilayer mirrors were all prepared by magnetron sputtering system in IPOE, and measured at NSRL, China.
Bai Liang
Chen Lingyan
Chen Rui
Huang Qiushi
Wang Xiaoqiang
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